Article (Scientific journals)
Microscale metasurfaces for on-chip magnetic flux concentration
Fourneau, Emile; Nguyen, Ngoc Duy; Palau, Anna et al.
2023In Advanced Materials Technologies
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Keywords :
Micromagnetism; MOKE; Magnetic Flux Concentrator
Abstract :
[en] Magnetic metamaterials have demonstrated promising perspectives to improve the efficiency of magnetic flux concentrators. In this work, we investigate the effects of downscaling these devices for on-chip integration. We scrutinize the influence of the non-linear magnetic response of the ferromagnetic components, their magnetic irreversibility, the formation of magnetic domains, as well as the effects of geometry and size of the devices. Our results demonstrate that the implementation of metasurfaces at the microscale opens up new technological possibilities for enhancing the performance of magnetic field detectors and remotely charging small electric devices, thus paving the way towards new approaches in information and communication technologies.
Disciplines :
Physics
Author, co-author :
Fourneau, Emile  ;  Université de Liège - ULiège > Complex and Entangled Systems from Atoms to Materials (CESAM)
Nguyen, Ngoc Duy  ;  Université de Liège - ULiège > Département de physique > Physique des solides, interfaces et nanostructures
Palau, Anna;  Institut de Ciència de Materials de Barcelona [ES] > ICMAB-CSIC
Arregi, jon Ander;  Brno University of Technology > CEITEC
Uhlir, Vojtech;  Brno University of Technology > CEITEC
Barrera, Aleix;  Institut de Ciència de Materials de Barcelona [ES] > ICMAB-CSIC
Sanchez, Alvaro;  Universitat Autonoma de Barcelona > Department of Physics
Bending, Simon;  University of Bath > Department of Physics > Centre for Nanoscience and Nanotechnology
Silhanek, Alejandro  ;  Université de Liège - ULiège > Département de physique > Physique expérimentale des matériaux nanostructurés
Language :
English
Title :
Microscale metasurfaces for on-chip magnetic flux concentration
Publication date :
07 April 2023
Journal title :
Advanced Materials Technologies
eISSN :
2365-709X
Publisher :
Wiley-Blackwell, Hoboken, United States - New Jersey
Peer reviewed :
Peer Reviewed verified by ORBi
Available on ORBi :
since 26 January 2023

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