Study of mechanical, physical and chemical properties of a-C:H films deposited by reactive magnetron sputtering in DC pulsed mode

Colaux, J. L.; Dumont, D.; Delwigne, T.; Breur, E.; Van Dievoet, F.; Strivay, David; Dille, J.; Lucas, S.

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Poster (Scientific congresses and symposiums)

Study of mechanical, physical and chemical properties of a-C:H films deposited by reactive magnetron sputtering in DC pulsed mode

Colaux, J. L.; Dumont, D.; Delwigne, T. et al.

2010 • 12th International Conference on Plasma Surface Engineering

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https://hdl.handle.net/2268/76771

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Disciplines :

Physical, chemical, mathematical & earth Sciences: Multidisciplinary, general & others

Author, co-author :

Colaux, J. L.

Dumont, D.

Delwigne, T.

Breur, E.

Van Dievoet, F.

Strivay, David ; Université de Liège - ULiège > Département de physique > Physique nucléaire, atomique et spectroscopie - Centre européen en archéométrie

Dille, J.

Lucas, S.

Language :

English

Title :

Study of mechanical, physical and chemical properties of a-C:H films deposited by reactive magnetron sputtering in DC pulsed mode

Publication date :

2010

Event name :

12th International Conference on Plasma Surface Engineering

Event place :

Garmisch-Partenkirchen, Germany

Event date :

13-17 septembre 2010

Audience :

International

Available on ORBi :

since 23 November 2010

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