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Erratum: Structural analysis of LaVO3 thin films under epitaxial strain
Meley, H.; Karandeep; Oberson, L. et al.
2018In APL Materials, 6, p. 046102
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Abstract :
[en] This article was originally published online on 4 April 2018 with an incorrect name of the second author. The name is correct as it appears above. All online versions were corrected on 6 April 2018. © Author(s) 2018.
Disciplines :
Physics
Author, co-author :
Meley, H.;  DQMP, University of Geneva, 24 Quai E.-Ansermet, Geneva, Switzerland
Karandeep;  Universit e de Li ege (B5), Li ege, Belgium
Oberson, L.;  Interdisciplinary Centre for Electron Microscopy (CIME), École Polytechnique Fe de rale de Lausanne (EPFL), Lausanne, Switzerland
De Bruijckere, J.;  DQMP, University of Geneva, 24 Quai E.-Ansermet, Geneva, Switzerland, Delft University of Technology, Lorentzweg 1, Delft, Netherlands
Alexander, D. T. L.;  Interdisciplinary Centre for Electron Microscopy (CIME), École Polytechnique Fe de rale de Lausanne (EPFL), Lausanne, Switzerland
Triscone, J.-M.;  DQMP, University of Geneva, 24 Quai E.-Ansermet, Geneva, Switzerland
Ghosez, Philippe  ;  Université de Liège - ULiège > Département de physique > Physique théorique des matériaux
Gariglio, S.;  DQMP, University of Geneva, 24 Quai E.-Ansermet, Geneva, Switzerland
Language :
English
Title :
Erratum: Structural analysis of LaVO3 thin films under epitaxial strain
Publication date :
2018
Journal title :
APL Materials
ISSN :
2166-532X
Publisher :
American Institute of Physics Inc.
Volume :
6
Pages :
046102
Peer reviewed :
Peer Reviewed verified by ORBi
Available on ORBi :
since 04 May 2021

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