Reference : Erratum: Structural analysis of LaVO3 thin films under epitaxial strain
Scientific journals : Other
Physical, chemical, mathematical & earth Sciences : Physics
http://hdl.handle.net/2268/259612
Erratum: Structural analysis of LaVO3 thin films under epitaxial strain
English
Meley, H. [DQMP, University of Geneva, 24 Quai E.-Ansermet, Geneva, Switzerland]
Karandeep [Universit e de Li ege (B5), Li ege, Belgium]
Oberson, L. [Interdisciplinary Centre for Electron Microscopy (CIME), École Polytechnique Fe de rale de Lausanne (EPFL), Lausanne, Switzerland]
De Bruijckere, J. [DQMP, University of Geneva, 24 Quai E.-Ansermet, Geneva, Switzerland, Delft University of Technology, Lorentzweg 1, Delft, Netherlands]
Alexander, D. T. L. [Interdisciplinary Centre for Electron Microscopy (CIME), École Polytechnique Fe de rale de Lausanne (EPFL), Lausanne, Switzerland]
Triscone, J.-M. [DQMP, University of Geneva, 24 Quai E.-Ansermet, Geneva, Switzerland]
Ghosez, Philippe mailto [Université de Liège - ULiège > Département de physique > Physique théorique des matériaux >]
Gariglio, S. [DQMP, University of Geneva, 24 Quai E.-Ansermet, Geneva, Switzerland]
2018
APL Materials
American Institute of Physics Inc.
6
046102
Yes (verified by ORBi)
2166-532X
[en] This article was originally published online on 4 April 2018 with an incorrect name of the second author. The name is correct as it appears above. All online versions were corrected on 6 April 2018. © Author(s) 2018.
http://hdl.handle.net/2268/259612
10.1063/1.5037455

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