Article (Scientific journals)
Stoichiometry of DyFeCo magneto-optical alloys by combined PIXE/RBS
Strivay, David; Weber, Georges; Fleury-Frenette, Karl et al.
1999In AIP Conference Proceedings, 475, p. 476
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Keywords :
Rutherford backscattering; Sputter deposition; Thin film deposition; Magnetooptical effects
Abstract :
[en] DyFeCo alloys offer suitable properties for magneto-optical recording. Their high write and erase sensitivity favors them as materials to design high density multilayer-based recording medium that would be addressed by temperature and field modulation. The samples consist of amorphous thin films of the order of 100 nm deposited by RF magnetron sputtering between an aluminum buffer and a thin aluminum native oxide capping layer onto Si or SiO2 substrates. The stoichiometry of these films has to be known in order to study their magnetic properties. Unfortunately, the analysis of this kind of sample is not obvious neither by RBS or PIXE. Indeed, as Fe and Co are neighbor elements, the RBS spectra do not allow to determine their elementary ratio. On the other hand, PIXE spectra are difficult to analyze due to the overlapping of the different peaks. By combining the two methods it has been possible to obtain the thickness and the stoichiometry of these samples. The experimental setup as well as the computation method used to attain this goal will be also described.
Disciplines :
Chemistry
Physics
Author, co-author :
Strivay, David  ;  Université de Liège > Département de physique > Spectroscopie atomique et nucléaire, archéométrie
Weber, Georges ;  Université de Liège > Centre européen en archéométrie
Fleury-Frenette, Karl ;  Université de Liège > CSL (Centre Spatial de Liège)
Delwiche, Jacques ;  Université de Liège > Relations académiques et scientifiques (Sciences)
Language :
English
Title :
Stoichiometry of DyFeCo magneto-optical alloys by combined PIXE/RBS
Publication date :
1999
Journal title :
AIP Conference Proceedings
ISSN :
0094-243X
eISSN :
1551-7616
Publisher :
American Institute of Physics, New York, United States - New York
Volume :
475
Pages :
476
Peer reviewed :
Peer Reviewed verified by ORBi
Available on ORBi :
since 25 August 2017

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