Design criteria for a hybrid nano/photolithography system

Niblock, T.; Kraft, Michael; Sehr, H.

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Design criteria for a hybrid nano/photolithography system

Niblock, T.; Kraft, Michael; Sehr, H.

2001 • In Proc. Conf. on Micromechanics Europe

Peer reviewed

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https://hdl.handle.net/2268/187893

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Disciplines :

Electrical & electronics engineering

Author, co-author :

Niblock, T.

Kraft, Michael ; Université de Liège > Dép. d'électric., électron. et informat. (Inst.Montefiore) > Systèmes microélectroniques intégrés

Sehr, H.

Language :

English

Title :

Design criteria for a hybrid nano/photolithography system

Publication date :

2001

Event name :

Proc. Conf. on Micromechanics Europe

Event place :

Cork, Ireland

Event date :

2001

By request :

Yes

Audience :

International

Main work title :

Proc. Conf. on Micromechanics Europe

Pages :

pp. 305-308

Peer reviewed :

Peer reviewed

Available on ORBi :

since 10 November 2015

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