Article (Scientific journals)
Improved surface quality of anisotropically etched silicon {111} planes for mm-scale integrated optics
Cotter, J. P.; Zeimpekis, Ioannis; Kraft, Michaël et al.
2013In Journal of Micromechanics and Microengineering, 23 (11), p. 117006
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Disciplines :
Electrical & electronics engineering
Author, co-author :
Cotter, J. P.
Zeimpekis, Ioannis
Kraft, Michaël ;  Université de Liège - ULiège > Dép. d'électric., électron. et informat. (Inst.Montefiore) > Systèmes microélectroniques intégrés
Hinds, Edward A.
Language :
English
Title :
Improved surface quality of anisotropically etched silicon {111} planes for mm-scale integrated optics
Publication date :
2013
Journal title :
Journal of Micromechanics and Microengineering
ISSN :
0960-1317
Publisher :
Institute of Physics Publishing, United Kingdom
Volume :
23
Issue :
11
Pages :
117006
Peer reviewed :
Peer Reviewed verified by ORBi
Available on ORBi :
since 10 March 2015

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