[en] A simple lift-off process was developed to rapidly fabricate nanopatterned photofunctional
surfaces. Dye molecules of a perylene derivative (PDID) were adsorbed irreversibly on clean
silicon through the holes of an electron-beam lithographied polymer mask. The subsequent
removal of the mask in a proper solvent results in PDID nanosized regions of width as small as
30 nm for stripes and of diameter as small as 120 nm for dots. Numerical analyses of atomic
force microscopy and laser-scanning confocal microscopy images show that the dye molecules
are confined to the regions defined by the lithographic process, with the integrated fluorescence
intensity being essentially proportional to the size of the nanofeatures. This demonstrates that a
simple organic lift-off process compatible with clean-room technology, and not involving any
chemical step, is able to produce photofunctional nanopatterned surfaces, even though the dye
is not chemically bonded to the silicon surface.
Disciplines :
Chemistry
Author, co-author :
Frederich, Nadia; Université catholique de Louvain
Duwez, Anne-Sophie ; Université de Liège - ULiège > Département de chimie (sciences) > Nano-chimie et systèmes moléculaires
Nysten, Bernard; Université catholique de Louvain
Muls, Benoit; Université catholique de Louvain
Hofkens, Johan; Katholieke Universiteit Leuven - KUL
Jonas, Alain M; Université catholique de Louvain
Habib Jiwan, Jean-Louis; Université catholique de Louvain
Language :
English
Title :
Nanopatterned monolayers of an adsorbed chromophore
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