[en] Wear resistance and the hardness of Al/Al2O3 nanolaminated films were investigated in this study. Monolithic films and multilayers were deposited on a silicon substrate with two different substrate temperatures: T-s= 25 degrees C and T-s= -90 degrees C. The period thickness of multilayers was lowering from 40 to 2 nm. From nanoindentation measurements, it appears that the hardness of multilayers has an intermediate value between those of metal (Al) and ceramic (Al2O3). The tribological test was conducted by the pin-on-disc method. The T-s=25 degrees C deposited multilayers, as well as single films, demonstrated poor wear resistance. The best wear resistance was obtained for multilayers deposited at the lowest substrate temperature (T-s= -90 degrees C). The results are ill good agreement with structural characterization. X-ray reflectometry demonstrated that the multilayer character of Al/Al2O3 is more pronounced for T-s= -90 degrees C. (C) 2000 Elsevier Science S.A. All rights reserved.
Disciplines :
Mechanical engineering
Author, co-author :
Ben Daia, M.; Laboratoire Multicouches Nanométriques (LMN), Université d’Evry, Bd F. Mitterand, 91023 Evry cedex, France
Aubert, P.; Laboratoire Multicouches Nanométriques (LMN), Université d’Evry, Bd F. Mitterand, 91023 Evry cedex, France
Labdi, S.; Laboratoire Multicouches Nanométriques (LMN), Université d’Evry, Bd F. Mitterand, 91023 Evry cedex, France
Le Paven-Thivet, C.; Laboratoire Multicouches Nanométriques (LMN), Université d’Evry, Bd F. Mitterand, 91023 Evry cedex, France
Houdy, P.; Laboratoire Multicouches Nanométriques (LMN), Université d’Evry, Bd F. Mitterand, 91023 Evry cedex, France
Bozet, Jean-Luc ; Université de Liège - ULiège > Département de chimie appliquée > Chimie appliquée - Cryotribologie
Language :
English
Title :
Mechanical properties of Al/Al2O3 nanolaminated films: correlation to microstructure
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Bibliography
Sproul, W.D., (1994) J. Vac. Sci. Technol. a, 12, p. 4
Kung, H., Jervis, T.R., Hirvonen, J.-P., Embry, J.D., Mitclell, T.E., Nastasi, M., (1995) Philos. Mag. a, 71, p. 4
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