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Zero-Bias Si Backward Diodes Detectors Incorporating P and B δ-Doping Layers Grown by Chemical Vapor Deposition
Park, Si-Young; Anisha, Ramesh; Berger, Paul et al.
2009In International Semiconductor Device Research Symposium, 2009
Peer reviewed
 

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Keywords :
Detector; Si diode; Delta-doping; CVD
Abstract :
[en] For the first time, CVD-grown Si only backward diode detectors incorporating ¿doping planes were demonstrated. The best performance of curvature coefficient of 16 V-1 with a junction resistance of 14 k¿ was shown. By the successful technology transfer from LT-MBE to CVD, the eventual placement of optimized CVD-grown detectors monolithically integrated with 300 mm CMOS platform to fabricate large area focal plane arrays with low cost is now possible.
Disciplines :
Electrical & electronics engineering
Author, co-author :
Park, Si-Young;  Ohio State University > Department of Electrical and Computer Engineering
Anisha, Ramesh;  Ohio State University > Department of Electrical and Computer Engineering
Berger, Paul;  Ohio State University > Department of Electrical and Computer Engineering and Department of Physics
Loo, Roger;  IMEC
Nguyen, Ngoc Duy  ;  IMEC
Takeuchi, Shotaro;  IMEC
Goossens, Jozefien;  IMEC
Caymax, Matty;  IMEC
Language :
English
Title :
Zero-Bias Si Backward Diodes Detectors Incorporating P and B δ-Doping Layers Grown by Chemical Vapor Deposition
Publication date :
2009
Event name :
International Semiconductor Device Research Symposium, 2009
Event organizer :
University of Maryland
Event place :
College Park, United States
Event date :
9-11/12/2009
Audience :
International
Main work title :
International Semiconductor Device Research Symposium, 2009
Publisher :
IEEE, Los Alamitos, United States
ISBN/EAN :
978-1-4244-6030-4
Peer reviewed :
Peer reviewed
Available on ORBi :
since 13 August 2010

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