Optimization of external poly base sheet resistance in 0.13 µm quasi self-aligned SiGe:C HBTs

[en] This paper investigates the optimization of the external polysilicon base sheet resistance of quasi self-aligned (QSA) SiGe:C HBTs from a 0.13 μm BiCMOS process. Taking advantage of optimized implant conditions to improve the doping of the external base poly, and using an optimized non-selective epitaxy process with improved growth rate ratio of 1.7 between the polycrystalline silicon and monocrystalline silicon of the base, the maximum oscillation frequency fmax reaches 300 GHz.

Disciplines :

Electrical & electronics engineering

Author, co-author :

You, Suzhen; IMEC

Van Huylenbroeck, Stefaan; IMEC

Nguyen, Ngoc Duy ; IMEC

Sibaja-Hernandez, Arturo; IMEC

Venegas, Rafael; IMEC

Van Wichelen, Koen; IMEC

Decoutere, Stefan; IMEC

De Meyer, Kristin; IMEC

Language :

English

Title :

Optimization of external poly base sheet resistance in 0.13 µm quasi self-aligned SiGe:C HBTs

Publication date :

2009

Journal title :

Thin Solid Films

ISSN :

0040-6090

Publisher :

Elsevier Science

Volume :

518

Issue :

Pages :

S68

Peer reviewed :

Peer Reviewed verified by ORBi

Available on ORBi :

since 13 August 2010

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Bibliography

Van Huylenbroeck S., Choi L.J., Sibaja-Hernandez A., Piontek A., Linten D., Dehan M., Dupuis O., Carchon G., Vleugels F., Kunnen E., Leray P., Devriendt K., Shi X.P., Loo R., Hijzen E., and Decoutere S. Bipolar/BiCMOS circuits and Technology Meeting, 8-10 Oct. (2006) 1
Ramirez-Garcia E., Zerounian N., Crozat P., Enciso-Aguilar M., Chevalier P., Chantre A., and Aniel F. Cryogenics 49 (2009) 620
Jeng S.J., Jagannathan B., Rieh J.-S., Johnson J., Schonenberg K.T., Greenberg D., Stricker A., Chen H., Khater M., Ahlgren D., Freeman G., Stein K., and Subbanna S. IEEE Electron Device Lett. 22 11 (November 2001) 542
Donkers J.J.T.M., Kramer M.C.J.C.M., Van Huylenbroeck S., Choi L.J., Meunier-Beillard P., Sibaja-Hernandez A., Boccardi G., van Noort W., Hurkx G.A.M., Vanhoucke T., Vleugels F., Winderickx G., Kunnen E., Peeters S., Baute D., De Vos B., Vandeweyer T., Loo R., Venegas R., Pijper R., Voogt F.C., Decoutere S., and Hijzen E.A. IEDM (Dec. 2007) 655
Avenier G., Chevalier P., Troillard G., Vandlle B., Brossard F., Depoyan L., Buczko M., Boret S., Montusclat S., Margain A., Pruvost S., Nicolson S.T., Yau K.H.K., Gloria D., Dutartre D., Voinigescu S.P., and Chantre A. BCTM proceedings (2008) 89
Racanelli M., and Kempf P. CICC proceedings (2003) 331
Böck J., Schäfer H., Knapp H., Aufinger K., Wurzer M., Boguth S., Böttner T., Stengl R., Perndl W., and Meister T.F. IEDM technical digest (2004) 255
Fox A., Heinemann B., Barth R., Bolze D., Drews J., Haak U., Knoll D., Kuck B., Kurps R., Marschmeryer S., Richter H.H., Rücker H., Schley P., Schmidt D., Tillack B., Weidner G., Wipf C., Wolansky D., and Yamamoto Y. IEDM Technical Digest (2008) 731
Orner B.A., Dahlstrom M., Pothiawala A., Rassel R.M., Liu Q., Ding H., Khater M., Ahlgren D., Joseph A., and Dunn J. BCTM proceedings (2006) 49
Wennekers P., and Reuter R. Proc. BCTM (2004) 79
Sze S.M., and Kwog N.G. Physics of Semiconductor Devices. Third Ed. (2007), Wiley, New York, NY
Van Huylenbroeck S., Sibaja-Hernandez A., Piontek A., Choi L.J., Xu M.W., Ouassif N., Vleugels F., Van Wichelen K., Witters L., Kunnen E., Leray P., Devriendt K., Shi X., Loo R., and Decoutere S. Proc. BCTM (Sept. 2004) 229
L.J. Choi, E. Kunnen, S. Van Huylenbroeck, A. Piontek, A. Sibaja-Hernandez, F. Vleugels, T. Dupont, P. Leray, K. Devriendt, X.P. Shi, R. Loo, S. Vanhaelemeersch, S. Decoutere, VLSI Technology, Systems and Applications, 2006 International Symposium on April 2006, p.1-2.
Piontek A., Choi L.J., Van Huylenbroeck S., Vanhoucke T., Hijzen E., and Decoutere S. Thin Solid Films 508 (2006) 318
Pejnefors J., Zhang S.-L., Radamson H.H., Grahn J.V., and Östling M. J. Appl. Phys. 88 (2000) 1655
Clarysse T., Vanhaeren D., Hoflijk I., and Vandervorst W. Materials Science & Engineering, Reports: A Review Journal vol. R47 (2004)
Vandervorst W., Clarysse T., and Eyben P. J. Vac. Sci. Technol. B 20 1 (Jan/Feb 2002) 451
Duhayon N., Eyben P., Fouchier M., Clarysse T., Vandervorst W., Álvarez D., Schoemann S., Ciappa M., Stangoni M., Fichtner W., Formanek P., Kittler M., Raineri V., Giannazzo F., Goghero D., Rosenwaks Y., Shikler R., Saraf S., Sadewasser S., Barreau N., Glatzel T., Verheijen M., Mentink S.A.M., von Sprekelsen M., Maltezopoulos T., Wiesendanger R., and Hellemans L. J. Vac. Sci. Technol. B 22 1 (Jan/Feb 2004) 385

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