Conformal ultra shallow junctions by vapor phase doping with boron

Nguyen, Ngoc Duy; Leys, Frederik; Takeuchi, Shotaro; Loo, Roger; Caymax, Matty; Eyben, Pierre; Vandervorst, Wilfried

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Conformal ultra shallow junctions by vapor phase doping with boron

Nguyen, Ngoc Duy; Leys, Frederik; Takeuchi, Shotaro et al.

2008 • 4th International SiGe Technology and Device Meeting (ISTDM)

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Keywords :

Vapor phase doping; Conformal doping; Ultra shallow junction; FinFET; Boron doping

Disciplines :

Electrical & electronics engineering

Author, co-author :

Nguyen, Ngoc Duy ; IMEC

Leys, Frederik; IMEC

Takeuchi, Shotaro; IMEC

Loo, Roger; IMEC

Caymax, Matty; IMEC

Eyben, Pierre; IMEC

Vandervorst, Wilfried; IMEC

Language :

English

Title :

Conformal ultra shallow junctions by vapor phase doping with boron

Publication date :

2008

Event name :

4th International SiGe Technology and Device Meeting (ISTDM)

Event organizer :

Nano Device Laboratories Taiwan

Event place :

Hsinchu, Taiwan

Event date :

11-14/5/2008

Audience :

International

Available on ORBi :

since 12 August 2010

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