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Antireflective subwavelength patterning of IR optics
Vandormael, Denis; Habraken, Serge; Loicq, Jerôme et al.
2006In Proceedings of SPIE: The International Society for Optical Engineering, 6395
Peer reviewed
 

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Keywords :
anti-reflection; infrared; moth-eye; replication; nano-imprint
Abstract :
[en] Thermal infrared (IR) lenses require efficient anti-reflection coating. Moth-eye (or egg-box) 2D subwavelength gratings have demonstrated their ability to reach a very high transmission for a wide wavelength and angular range. The use in thermal IR is simplified by the lower resolution for lithographic technology, compared to visible waveband. However, deeper structures must be engraved and lithography must be adapted to IR materials. In order to be cost-effective, the patterning must be produced by replication techniques, such as embossing. Our laboratory is now experimenting hot embossing of moth-eye patterns in chalcogenide substrates. In this paper, theoretical analysis, micro-lithographic technology and manufacturing processes are detailed.
Disciplines :
Physics
Author, co-author :
Vandormael, Denis;  Université de Liège - ULiège > CSL (centre spatial de Liège)
Habraken, Serge ;  Université de Liège - ULiège > Département de physique > Optique - Hololab - CSL (Centre Spatial de Liège)
Loicq, Jerôme ;  Université de Liège - ULiège > CSL (Centre Spatial de Liège)
Lenaerts, Cedric ;  Université de Liège - ULiège > Departement de physique > Hololab
mawet, Dimitri;  Université de Liège - ULiège > Astrophysique
Language :
English
Title :
Antireflective subwavelength patterning of IR optics
Publication date :
2006
Audience :
International
Journal title :
Proceedings of SPIE: The International Society for Optical Engineering
ISSN :
0277-786X
eISSN :
1996-756X
Publisher :
International Society for Optical Engineering, Bellingham, United States - Washington
Volume :
6395
Peer reviewed :
Peer reviewed
Available on ORBi :
since 03 June 2010

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