Article (Scientific journals)
Assessment of atomic layer deposited TiO2 photocatalytic self-cleaning by quartz crystal microbalance
Henry, Théo; Martins, Paolo; Eustache, Etienne et al.
2020In Journal of Vacuum Science & Technology A: Vacuum, Surfaces, and Films, 38 (4), p. 043404
Peer reviewed
 

Files


Full Text
6.0000198.pdf
Publisher postprint (2.59 MB)
Download

This article may be downloaded for personal use only. Any other use requires prior permission of the author and AIP Publishing. This article appeared in Henry, Théo, et al. "Assessment of atomic layer deposited TiO2 photocatalytic self-cleaning by quartz crystal microbalance." Journal of Vacuum Science & Technology A: Vacuum, Surfaces, and Films 38.4 (2020): 043404. and may be found at https://avs.scitation.org/doi/10.1116/6.0000198. For Creative Commons licensed material, please use: “Copyright (year) Author(s)." This article is distributed under a Creative Commons Attribution (CC BY) License.


All documents in ORBi are protected by a user license.

Send to



Details



Keywords :
Atomic layer deposition; Vacuum technology; Surface and interface chemistry; Thin films; Photocatalysis; Quartz crystal microbalance
Abstract :
[en] The self-cleaning properties emerging from photocatalytic effects consist in the elimination of an organic contamination layer by light-induced redox reactions. Quartz crystal microbalances (QCMs), monitoring the contaminant mass loss under UV illumination, were used to investigate this effect and its efficiency. A new setup dedicated to such purpose is introduced along with the results of a self-cleaning experiment performed with a 20-nm TiO2 thin film coated on a QCM by atomic layer deposition. In particular, a 10-nm paraffin oil thin film deposited under vacuum is shown to be degraded down to its complete removal according to a zeroth order photocatalytic reaction. Finally, the experimental opportunities offered by the new setup, such as a controlled environment composition, are presented.
Research center :
Surface Micro & Nano Engineering Laboratory, Centre Spatial de Liège (CSL), Space Sciences, Technologies and Astrophysics Research (STAR) Institute, University of Liège, Avenue du Pré-Aily, Liege Science Park, B29 4031 Angleur, Belgium
Thales Research & Technology France, Campus Polytechnique, 1 avenue Augustin Fresnel, 91767 Palaiseau Cedex, France
Thales Alenia Space, 5 Allée des Gabins BP99, 06156 Cannes La Bocca Cedex, France
Disciplines :
Physical, chemical, mathematical & earth Sciences: Multidisciplinary, general & others
Author, co-author :
Henry, Théo ;  Université de Liège - ULiège > CSL (Centre Spatial de Liège)
Martins, Paolo
Eustache, Etienne
Servet, Bernard
Divay, Laurent
Jouanne, Pierre
Grasset, Philippe
Dudon, Jean-Paul
Hugonnot, Patrick
Fleury-Frenette, Karl ;  Université de Liège - ULiège > CSL (Centre Spatial de Liège)
Language :
English
Title :
Assessment of atomic layer deposited TiO2 photocatalytic self-cleaning by quartz crystal microbalance
Publication date :
02 June 2020
Journal title :
Journal of Vacuum Science & Technology A: Vacuum, Surfaces, and Films
ISSN :
1520-8559
Volume :
38
Issue :
4
Pages :
043404
Peer reviewed :
Peer reviewed
Available on ORBi :
since 15 January 2021

Statistics


Number of views
70 (12 by ULiège)
Number of downloads
134 (5 by ULiège)

Scopus citations®
 
6
Scopus citations®
without self-citations
5
OpenCitations
 
2

Bibliography


Similar publications



Contact ORBi