Monitoring of Diffraction Efficiency, During Replication Process of a Diffraction Grating on Convex Substrate by Solvent Vapor Assisted Imprinting Lithography
[en] For several reasons and in many fields, the replication of structures or
nanostructures is realized. Actually, a lot of techniques exist, and the quality
evaluation of the replication process is generally realized after replication process.
In such conditions, the determination of adequate duration is a challenge.
Diffraction grating replication realized by solvent vapor assisted imprinting
lithography (SVAIL) process, on convex substrate, is here reported. Photoresist
coating on convex substrate is also a challenge. It is treated in this paper before
going on with replication and experimental measurement. Next, with that coated
convex substrate, diffraction grating replication is realized. And the diffraction
efficiency is monitored in real time during the replication process. The monitoring
indicates the variation of diffraction efficiency during the evolution of SVAIL
process. The comparison of monitored diffraction efficiency to theoretical
simulations of diffraction efficiency for various steps of SVAIL process, allows to
deduce the value of diffraction efficiency for optimal replication; and finally, the
required duration of the replication process for optimal result is deduced.
Habraken, Serge ; Université de Liège - ULiège > Département de physique > Optique - Hololab
Language :
English
Title :
Monitoring of Diffraction Efficiency, During Replication Process of a Diffraction Grating on Convex Substrate by Solvent Vapor Assisted Imprinting Lithography
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