Article (Scientific journals)
Atomic structure of Sr/Si(0 0 1)(1 × 2) surfaces prepared by Pulsed laser deposition
Parkelj Potočnik, T.; Zupanič, E.; Tong, Wenyi et al.
2019In Applied Surface Science, 471, p. 664-669
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Keywords :
DFT; Pulsed laser deposition; Scanning tunneling microscopy; Silicon; Strontium; Surface defects; Buffer layers; Crystal atomic structure; Programmable logic controllers; Temperature; DFT calculation; Functional oxides; Low-amplitude; Low-temperature scanning tunneling microscopy; Measured values; Precise control; Si(0 0 1) surface; Situ reflection; Pulsed lasers
Abstract :
[en] A buffer layer formed by depositing a ½ monolayer of Sr on Si(0 0 1) is known to passivate the Si surface, while its surface structure constitutes a suitable template for the integration of various functional oxides with the existing Si platform. We used Pulsed Laser Deposition (PLD) to prepare a Sr/Si(0 0 1)(1 × 2) surface and analysed it using in-situ Reflection High-Energy Diffraction (RHEED) in combination with low-temperature Scanning Tunneling Microscopy (STM). The STM images reveal an atomically ordered surface with terraces composed of one-dimensional (1D) chains running along perpendicular directions on neighbouring terraces. The 1D chains are separated by 0.78 nm and exhibit a low-amplitude corrugation with a period of 0.39 nm. The measured values agree well with the size of the (1 × 2) unit cell observed for similar MBE-grown surfaces, while the density of the surface defects is somewhat higher in the presented case. According to simulated STM images based on DFT calculations, two types of surface defects were identified and explored: arrays of Sr vacancies and Sr adatoms. These results show that PLD can offer precise control for the preparation of high-quality Sr-buffered Si(0 0 1) surfaces. © 2018 Elsevier B.V.
Disciplines :
Physics
Author, co-author :
Parkelj Potočnik, T.;  Advanced Materials Department, Jožef Stefan Institute, Jamova 39, Ljubljana, 1000, Slovenia, Jožef Stefan International Postgraduate School, Jamova 39, Ljubljana, 1000, Slovenia
Zupanič, E.;  Condensed Matter Physics Department, Jožef Stefan Institute, Jamova 39, Ljubljana, 1000, Slovenia
Tong, Wenyi ;  Université de Liège - ULiège > Département de physique > Physique théorique des matériaux
Bousquet, Eric  ;  Université de Liège - ULiège > Département de physique > Physique théorique des matériaux
Diaz Fernandez, D.;  Advanced Materials Department, Jožef Stefan Institute, Jamova 39, Ljubljana, 1000, Slovenia
Koster, G.;  Advanced Materials Department, Jožef Stefan Institute, Jamova 39, Ljubljana, 1000, Slovenia, Faculty of Science and Technology and MESA+ Institute for Nanotechnology, University of Twente, P.O. Box 217, 7500 AE Enschede, Netherlands
Ghosez, Philippe  ;  Université de Liège - ULiège > Département de physique > Physique théorique des matériaux
Spreitzer, M.;  Advanced Materials Department, Jožef Stefan Institute, Jamova 39, Ljubljana, 1000, Slovenia
Language :
English
Title :
Atomic structure of Sr/Si(0 0 1)(1 × 2) surfaces prepared by Pulsed laser deposition
Publication date :
2019
Journal title :
Applied Surface Science
ISSN :
0169-4332
Publisher :
Elsevier B.V., Netherlands
Volume :
471
Pages :
664-669
Peer reviewed :
Peer Reviewed verified by ORBi
Tags :
CÉCI : Consortium des Équipements de Calcul Intensif
Tier-1 supercomputer
Funders :
Javna Agencija za Raziskovalno Dejavnost RS: PR-06807, J2-9237, J2-6759Fédération Wallonie-Bruxelles11175452.5020.1, Tier-1
CÉCI - Consortium des Équipements de Calcul Intensif [BE]
Tier-1
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