Numerical study of atomic diffusion processes of copper on silver (110) surface: Cu/Ag (110)

Sbiaai, K.; Boughaleb, Y.; Raty, Jean-Yves; Hajjaji, A.; Mazroui, M.; Kara, A.

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Numerical study of atomic diffusion processes of copper on silver (110) surface: Cu/Ag (110)

Sbiaai, K.; Boughaleb, Y.; Raty, Jean-Yves et al.

2012 • In Journal of Optoelectronics and Advanced Materials, 14 (11-12), p. 1059-1065

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Keywords :

Jump rate; Molecular dynamics simulation; Surface diffusion; Velocity correlation function

Abstract :

[en] The aim of this paper is to study the diffusion of Cu adatom on Ag (110) by using the molecular dynamics simulation in the framework of the embedded atom method (EAM) as model of atomic interaction. Our simulation results predict that several diffusion processes such as simple jump, long jump and exchange mechanism may occur in the same system. The static barrier is calculated for each process by the drag method. The dynamic activation energy calculated from the Arrhenius law is in a good agreement with the static barrier. The presence of double jump is studied using velocity correlation function showing small contributions in diffusion process. Implications of these findings are discussed in more details.

Disciplines :

Materials science & engineering

Author, co-author :

Sbiaai, K.; Laboratoire de la Physique de la Matière Condensée, Université Chouaïb Doukkali, Morocco, Laboratoire de la Physique de la Matière Condensée, Université de Liège, Belgium

Boughaleb, Y.; Laboratoire de la Physique de la Matière Condensée, Université Chouaïb Doukkali, Morocco, Laboratoire la Physique de la Matière Condensée, Université Hassan II Mohammedia, Morocco, Hassan II Academy of Sciences and Technology, Rabat, Morocco

Raty, Jean-Yves ; Université de Liège - ULiège > Département de physique > Physique de la matière condensée

Hajjaji, A.; Ecole Nationale des Sciences Appliquées (ENSAJ), Université Chouaïb Doukkali, Morocco

Mazroui, M.; Laboratoire la Physique de la Matière Condensée, Université Hassan II Mohammedia, Morocco

Kara, A.; Department of Physics, University of Central Florida, United States

Language :

English

Title :

Numerical study of atomic diffusion processes of copper on silver (110) surface: Cu/Ag (110)

Publication date :

2012

Journal title :

Journal of Optoelectronics and Advanced Materials

ISSN :

1454-4164

eISSN :

1841-7132

Publisher :

National Institute of Research and Development for Optoelectronics, Romania

Volume :

Issue :

11-12

Pages :

1059-1065

Peer reviewed :

Peer reviewed

Available on ORBi :

since 10 January 2019

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