Reference : Control of Solvent Vapor Assisted Imprinting Lithography Process by Real Time Mon...
Scientific journals : Article
Physical, chemical, mathematical & earth Sciences : Physics
http://hdl.handle.net/2268/225272
Control of Solvent Vapor Assisted Imprinting Lithography Process by Real Time Monitoring of Grating Diffraction Efficiency
English
Horugavye, Georges mailto [Université de Liège - ULiège > > > Doct. sc. (physique - Bologne)]
Sabushimike, Bernard mailto [Université de Liège - ULiège > > > Form. doct. sc. (sc. spatiales - paysage)]
Habraken, Serge mailto [Université de Liège - ULiège > Département de physique > Optique - Hololab >]
14-May-2018
International Journal of Nanotechnology and Applications
Research India Publications
12
1-11
Yes (verified by ORBi)
International
0973-631X
Inde
[en] replication ; solvent ; vapor ; diffraction ; grating
[en] Diffraction grating replication realized by solvent vapor assisted imprinting
lithography (SVAIL) process is here reported. Diffraction efficiency was monitored in real time. The monitoring indicated the variation of diffraction efficiency during the evolution of SVAIL process. According to initial value of monitored diffraction efficiency and to theoretical simulations of diffraction efficiency for various steps of SVAIL process, the value of diffraction efficiency for optimal replication was deduced; and the process could be stopped at that value.
Researchers
http://hdl.handle.net/2268/225272
https://www.ripublication.com/ijna18/ijnav12n1_01.pdf

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