Abstract :
[en] Thanks to its high sensitivity to displacement, holography is very well
suited for metrology. In the case of holographic interferometry (HI), interference
occurs between the object wavefront and a wavefront reconstructed by a hologram
allowing a comparison between different objects, or different states of the same
object. This chapter first discusses the importance of HI compared to other techniques
such as electronic or computer based interferometry, then the author is
developing various methodologies for holographic metrology, including real time,
double exposure, and time averaged HI. Material considerations are covered and
the specific case of photorefractive polymer and crystals are analyzed. Several
experiments of nondestructive testing on industrial systems are discussed with
measurement configurations relevant for thermal analysis, vibration, defect detection,
and even historic artifact investigation.
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