Roughness evolution of sol-gel optical coatings by ion beam sputtering

The surface roughness evolution of two silica-based sol-gel materials under 650 eV argon ion beam sputtering has been investigated. The liquid sol-gel solutions had been applied on silicon substrates using the dip coating technique and then thermally cured to obtain solid thin films. Their thickness had then been controlled over the samples surface using spectroscopic ellipsometry. The surface roughness of the sol-gel films has been measured using both interferometric profilometry and atomic force microscopy at different sputtering depths. Roughness increases significantly faster with sputtering depth in sol-gel layers
than on bulk fused silica. Interestingly, the sputtering rates of the sol-gel layers are also observed to be much higher that of bulk fused silica. The development of micron scale holes with relatively stable interstices rules the surface roughness evolution. AFM measurements revealed a regular submicron scale lateral structure which nanometric amplitude is amplified under sputtering.