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Vapor phase doping and sub-melt laser anneal for ultra-shallow extension junctions in sub-32 nm CMOS technology
Nguyen, Ngoc Duy; Rosseel, Erik; Takeuchi, Shotaro et al.
2009 • In Chiussi, S.; Alpuim, P.; Murota, J. et al. (Eds.) SiNEP 2009. 1st International Workshop on Si based nano-electronics and -photonics

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Nguyen_SiNEP_2009.pdf

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