Wirths, S., Stange, D., Pampillon, M.-A., Tiedemann, A., Mussler, G., Fox, A., Breuer, U., Baert, B., San Andres, E., Nguyen, N. D., Hartmann, J.-M., Ikonic, Z., Mantl, S., & Buca, D. (2015). High‐k Gate Stacks on Low Bandgap Tensile Strained Ge and GeSn Alloys for Field-Effect Transistors.
ACS Applied Materials and Interfaces, 7, 62-67. doi:10.1021/am5075248
https://hdl.handle.net/2268/196534
