Nanoindentation investigation of Ti/TiN multilayers films

Ben Daia, M.; Aubert, P.; Labdi, S.; Sant, C.; Sadi, F. A.; Houdy, Ph.; Bozet, Jean-Luc

doi:10.1063/1.373450

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Nanoindentation investigation of Ti/TiN multilayers films

Ben Daia, M.; Aubert, P.; Labdi, S. et al.

2000 • In Journal of Applied Physics, 87 (11), p. 7753-7757

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DOI
10.1063/1.373450

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Keywords :

titanium; titanium compounds; Young's modulus; nanostructured materials; indentation; X-ray reflection; sputtered coatings; multilayers; hardness

Abstract :

[en] The hardness of Ti/TiN nanolaminated films is investigated in this study. Monolithic Ti and TiN films and Ti/TiN multilayers were deposited on silicon substrates by radio-frequency sputtering. The period thickness of multilayers was decreased from 20 to 2.5 nm. Grazing x-ray reflectometry showed that the modulation of composition of Ti/TiN multilayers exists for all the period thickness considered. From nanoindentation measurements, we determined the hardness and Young's modulus of multilayers. Hardness increased with decreasing period thickness to go beyond the rule-of-mixture value for samples with period thickness of Lambda less than or equal to 5 nm. The maximum hardness, 1.6 times higher than the value obtained by the rule of mixture, is obtained for Lambda=2.5 nm. Our results are compared to a dislocation-based model previously introduced by Lehoczky. (C) 2000 American Institute of Physics. [S0021-8979(00)09411-1].

Disciplines :

Mechanical engineering

Author, co-author :

Ben Daia, M.; Laboratoire Multicouches Nanométriques (LMN), Université d'Evry Val d'Essonne, Bd F. Mitterrand, 91025 Evry cedex, France

Aubert, P.; Laboratoire Multicouches Nanométriques (LMN), Université d'Evry Val d'Essonne, Bd F. Mitterrand, 91025 Evry cedex, France

Labdi, S.; Laboratoire Multicouches Nanométriques (LMN), Université d'Evry Val d'Essonne, Bd F. Mitterrand, 91025 Evry cedex, France

Sant, C.; Laboratoire Multicouches Nanométriques (LMN), Université d'Evry Val d'Essonne, Bd F. Mitterrand, 91025 Evry cedex, France

Sadi, F. A.; Laboratoire Multicouches Nanométriques (LMN), Université d'Evry Val d'Essonne, Bd F. Mitterrand, 91025 Evry cedex, France

Houdy, Ph.; Laboratoire Multicouches Nanométriques (LMN), Université d'Evry Val d'Essonne, Bd F. Mitterrand, 91025 Evry cedex, France

Bozet, Jean-Luc ; Université de Liège - ULiège > Département de chimie appliquée > Chimie appliquée - Cryotribologie

Language :

English

Title :

Nanoindentation investigation of Ti/TiN multilayers films

Publication date :

2000

Journal title :

Journal of Applied Physics

ISSN :

0021-8979

eISSN :

1089-7550

Publisher :

American Institute of Physics, Melville, United States - New York

Volume :

Issue :

Pages :

7753-7757

Peer reviewed :

Peer Reviewed verified by ORBi

Available on ORBi :

since 01 April 2011

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