Nanoindentation investigation of Ti/TiN multilayers films

Ben Daia, M.; Aubert, P.; Labdi, S.; Sant, C.; Sadi, F. A.; Houdy, Ph.; Bozet, Jean-Luc

doi:10.1063/1.373450

No full text

Article (Scientific journals)

Nanoindentation investigation of Ti/TiN multilayers films

Ben Daia, M.; Aubert, P.; Labdi, S. et al.

2000 • In Journal of Applied Physics, 87 (11), p. 7753-7757

Peer Reviewed verified by ORBi

Permalink
https://hdl.handle.net/2268/88137

DOI
10.1063/1.373450

Files (0)Send to Details Statistics Bibliography Similar publications

Files

Full Text

No document available.

Send to

RIS BibTex APA Chicago Permalink X Linkedin

Details

Keywords :

titanium; titanium compounds; Young's modulus; nanostructured materials; indentation; X-ray reflection; sputtered coatings; multilayers; hardness

Abstract :

[en] The hardness of Ti/TiN nanolaminated films is investigated in this study. Monolithic Ti and TiN films and Ti/TiN multilayers were deposited on silicon substrates by radio-frequency sputtering. The period thickness of multilayers was decreased from 20 to 2.5 nm. Grazing x-ray reflectometry showed that the modulation of composition of Ti/TiN multilayers exists for all the period thickness considered. From nanoindentation measurements, we determined the hardness and Young's modulus of multilayers. Hardness increased with decreasing period thickness to go beyond the rule-of-mixture value for samples with period thickness of Lambda less than or equal to 5 nm. The maximum hardness, 1.6 times higher than the value obtained by the rule of mixture, is obtained for Lambda=2.5 nm. Our results are compared to a dislocation-based model previously introduced by Lehoczky. (C) 2000 American Institute of Physics. [S0021-8979(00)09411-1].

Disciplines :

Mechanical engineering

Author, co-author :

Ben Daia, M.; Laboratoire Multicouches Nanométriques (LMN), Université d'Evry Val d'Essonne, Bd F. Mitterrand, 91025 Evry cedex, France

Aubert, P.; Laboratoire Multicouches Nanométriques (LMN), Université d'Evry Val d'Essonne, Bd F. Mitterrand, 91025 Evry cedex, France

Labdi, S.; Laboratoire Multicouches Nanométriques (LMN), Université d'Evry Val d'Essonne, Bd F. Mitterrand, 91025 Evry cedex, France

Sant, C.; Laboratoire Multicouches Nanométriques (LMN), Université d'Evry Val d'Essonne, Bd F. Mitterrand, 91025 Evry cedex, France

Sadi, F. A.; Laboratoire Multicouches Nanométriques (LMN), Université d'Evry Val d'Essonne, Bd F. Mitterrand, 91025 Evry cedex, France

Houdy, Ph.; Laboratoire Multicouches Nanométriques (LMN), Université d'Evry Val d'Essonne, Bd F. Mitterrand, 91025 Evry cedex, France

Bozet, Jean-Luc ; Université de Liège - ULiège > Département de chimie appliquée > Chimie appliquée - Cryotribologie

Language :

English

Title :

Nanoindentation investigation of Ti/TiN multilayers films

Publication date :

2000

Journal title :

Journal of Applied Physics

ISSN :

0021-8979

eISSN :

1089-7550

Publisher :

American Institute of Physics, Melville, United States - New York

Volume :

Issue :

Pages :

7753-7757

Peer reviewed :

Peer Reviewed verified by ORBi

Available on ORBi :

since 01 April 2011

Statistics

Number of views

73 (0 by ULiège)

Number of downloads

0 (0 by ULiège)

More statistics

Scopus citations^®

Scopus citations^®
without self-citations

OpenCitations

OpenAlex citations

Bibliography

Oliver, W.C., Pharr, G.M., (1992) J. Mater. Res., 7, p. 1564
Veprek, S., Reiprich, S., Shizhi, L., (1995) Appl. Phys. Lett., 66, p. 2640
Shinn, M., Hultman, L., Barnett, S.A., (1992) J. Mater. Res., 7, p. 901
Misra, A., Kung, H., Mitchell, T.E., Jervis, T.R., Nastasi, M., (1998) Mater. Res. Soc. Symp. Proc., 505, p. 583
Krzanowski, E., (1991) Scr. Metall. Mater., 25, p. 1465
Koehler, J.S., (1970) Phys. Rev. B, 2, p. 547
Lehoczky, S.L., (1978) Phys. Rev. Lett., 41, p. 1814
Chu, X., Barnett, S.A., (1995) J. Appl. Phys., 77, p. 4403
Shih, K.K., Dove, D.B., (1992) Appl. Phys. Lett., 61, p. 656
Hall, E.O., (1951) Proc. Phys. Soc. London, 64, p. 747. , Sect. B
Bull, S.J., Jones, A.M., (1996) Surf. Coat. Technol., 78, p. 173
Simmonds, M.C., Van Swygeenhoven, H., Pfüger, E., Savan, A., Hauert, R., Knoblauch, L., Mikhailov, S., (1997) Surf. Coat. Technol., 94-95, p. 490
Craven, A.J., Scott, C.P., MacKenzie, M., Hatto, P., Davies, C., (1998) Surf. Coat. Technol., 108-109, p. 217
Labdi, S., Houdy, Ph., Psyllaki, P., Jeandin, M., (1996) Thin Solid Films, 275, p. 213
Randall, N.X., Julia-Schmutz, C., Soro, J.M., Von Stebut, J., Zacharie, G., (1997) Thin Solid Films, 308-309, p. 297
Scharf, T.W., Barnard, J.A., (1997) Thin Solid Films, 308-309, p. 340
Bromark, M., Larsson, M., Hedenqvist, P., Hogmark, S., (1997) Surf. Coat. Technol., 90, p. 217
Chu, X., Wong, M.S., Sproul, W.D., Barnett, S.A., (1999) J. Mater. Res., 14, p. 2500
Chu, X., Wong, M.S., Sproul, W.D., Barnett, S.A., (1993) Surf. Coat. Technol., 61, p. 251
Karimi, A., Shojaei, O.R., Kruml, T., Martin, J.L., (1997) Thin Solid Films, 308-309, p. 334
Mirkarimi, P.B., Barnett, S.A., Hubbard, K.M., Jervis, T.R., Hultman, L., (1994) J. Mater. Res., 9, p. 1456
Gleisler, H., Schweitz, K.O., Chevallier, J., Bottiger, J., Samwer, K., (1999) Philos. Mag. A, 79, p. 485
Madan, A., Wang, Y.-Y., Barnett, S.A., Engström, C., Ljungcrantz, H., Hultman, L., Grimsditch, M., (1998) J. Appl. Phys., 84, p. 776
Kusano, E., Kitagawa, M., Nanto, H., Kinbara, A., (1998) Mater. Res. Soc. Symp. Proc., 505, p. 577
Yang, W.M.C., Tsakalakos, T., Hilliard, J.E., (1977) J. Appl. Phys., 48, p. 876
Helmersson, U., Torodova, S., Barnett, S.A., Sundgren, J.E., Markert, L.C., Greene, J.E., (1987) J. Appl. Phys., 62, p. 481
Small, M.K., Daniels, B.J., Clemens, B.M., Nix, W.D., (1994) Appl. Phys. Lett., 64, p. 61
Fetch, N.J., (1953) J. Iron Steel Inst., 174, p. 25. , London
Kelly, A., (1987) Philos. Trans. R. Soc. London, 322, p. 409. , Ser. A
Lépinoux, J., (1998) Solid State Phenom., 59-60, p. 115
Anderson, P.M., Foecke, T., Hazzledine, P.M., (1999) MRS Bull., 24, p. 27